The Origin and Control of Residual Stresses in Nanocrystalline Thin Films: The Roles of Stress Relaxation During Growth
Carl V. Thompson, Jeffrey S. Leib, Reiner Mönig, and Andrew Takahashi Dept. of Materials Science and Engineering Microsystems Technology Laboratory MIT
Outline:
Overview of phenomenology
Stress relaxation during coalescence
Post-coalescence relaxation
Formation of a Polycrystalline Film
Stress vs. Thickness for Films Deposited via Evaporative Deposition
Presentations 
